The IonKleenTM G2 AQ Purifier has been specifically designed for the removal of metal ions from ultrapure water at high flow process conditions. It is ideally suited for use in the semiconductor industry’s most critical final cleaning processes. Utilizing Pall’s IonKleen G2 AQ membrane, the surface has been modified to incorporate ion exchange groups on its surface resulting in spontaneous and immediate metal removal from ultrapure water.
1For liquids with viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.
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Product Type: TFF Cassettes and Modules
Segment: Semiconductor
Segment: Photovoltaics, Semiconductor